| Glossary L |
Lithography GlossaryWritten by Chris Mack A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z
Latent Image Example: The latent image was visible to the naked eye due to the change in the resist optical properties with exposure. LER LES Levenson PSM Lifting, Resist Example: Resist lifting could not be avoided without the use of an adhesion promoter. Lift-Off Process Example: The lift-off process allowed the patterning of the metal without the use of an etch step. Line Edge Roughness (LER) Example: One simple measure of line edge roughness is the RMS deviation of an edge from a best fit straight line. Line End Shortening (LES) Example: The amount of line end shortening for the feature increased sharply when out of focus. Linewidth Lithographer Example: The overworked and under appreciated lithographer paused for a moment and daydreamed, "Will Moore's Law ever end?" Lithography Example: Although lithography is a centuries-old patterning technique, the small features used in integrated circuits make semiconductor lithography very challenging. LSI Example: As integrated circuits entered the LSI era, contact and proximity printing gave way to projection lithography. A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z
|
