The SensArray Process Probe 1840 instrumented wafers provide accuracy previously unattainable in real- time hot plate temperature measurements. With up to 34 RTDs (resistance temperature devices), the 1840 can be used in processes ranging from 0°C to 250°C, including photoresist track systems and wafer probers. It allows you to directly measure wafer temperature stability and uniformity without dependence on imprecise process monitors or contact temperature sensors. As advanced photolithography processes demand tighter control of photoresist bake temperature and temperature uniformity, greater temperature accuracy can increase yield.
Process Probe™ 1840