SAN JOSE, Calif., Mar. 20, 2001 - KLA-Tencor Corp. (Nasdaq: KLAC) today announced a significant milestone with the shipment of its 500th ultraviolet spectroscopic ellipsometry (UV-SE) system. The milestone shipment was sent to Texas Instruments (TI), the world leader in digital signal processing and analog technologies, for use in KFAB, TI's technology development and process transfer fab, located in Dallas, Texas. TI has placed a repeat order for KLA-Tencor's ASET-F5x thin-film measurement tool, its latest-generation UV-SE system, to optimize TI's copper/low-k dielectric and high-k gate dielectric manufacturing processes.

Shrinking design rules and increasing device complexity resulting from new materials, processes, and design architectures have created new challenges for advanced semiconductor manufacturers. At the sub-0.13 micron level, performing multi-variable thickness measurements on low-k dielectric structures and complex antireflective layers becomes critical to improving process yields. These factors are driving the growing need for advanced metrology tools with the tool-to-tool matching, precision, ease of use and throughput needed to optimize process control for advanced dual damascene devices. KLA-Tencor's UV-SE technology is the only thin-film metrology solution currently capable of meeting all these needs.

"The use of complex film layers at 0.18-micron processing and beyond dictates the need for multi-variable thickness measurements for tighter process control," said Allen Bowling, manager of TI's Materials and Equipment Technology Department, Silicon Technology Research.

"KLA-Tencor's F5x thin-film measurement system with its UV-SE capability has enabled critical film measurements for development and production of advanced integrated circuits (ICs), and is a key process control tool. Its measurement stability and production worthiness has helped us to rapidly introduce process control for new processes and assisted fan out to production fabs."

The ASET-F5x is KLA-Tencor's most advanced UV-SE thin-film measurement tool designed for use in IC production down to the 0.10-micron node. It delivers the needed multi-variable thickness process control required for complex film stacks incorporating anti-reflective layers (ARLs) and low-k dielectric thin films. The ASET-F5x collects measurement data across a continuous wavelength spectrum from 193 nm to 800 nm.

"This milestone order demonstrates the strong industry demand for our leading metrology tools," said Sergio Edelstein, general manager of KLA-Tencor's Films and Surface Technology Division. "With systems in use by 18 of the top 20 global semiconductor manufacturers, KLA-Tencor currently leads the UV-SE market. The experience we have gained as a result of this broad installed base has enabled us to continually refine our UV-SE technology to provide our customers with leading-edge metrology solutions with the greatest precision and tool-to-tool matching, highest throughput and lowest cost of ownership available in the industry."


About KLA-Tencor: KLA-Tencor is the world leader in yield management and process control solutions for semiconductor manufacturing and related industries. Headquartered in San Jose, Calif., the company has sales and service offices around the world. An S&P 500 company, KLA-Tencor is traded on the Nasdaq National Market under the symbol KLAC.

Contact:
Meggan Powers
Director Corporate Communications