SAN JOSE, Calif., July 2, 2001 - KLA-Tencor Corp. (Nasdaq: KLAC) today unveiled its Printability Analysis Stepper Simulator™ (PASS), a new software tool that can provide photomask manufacturers with significant time and cost savings by automating the reticle defect analysis process and reducing the amount of repair work needed for sub-wavelength photomasks. With this new tool, KLA-Tencor's suite of advanced reticle inspection systems now has the ability to characterize and simulate the printability of defects on these advanced photomasks-providing better process control and reducing reticle manufacturing cycle time. PASS is based on Numerical Technologies' (Nasdaq: NMTC) Virtual Stepper™ technology, which is used to ensure the integrity of photomasks used in the production of advanced integrated circuits with 0.18-micron and smaller design rules.

According to International SEMATECH, photomask production costs have doubled from the 0.25-micron node to the 0.13-micron node, and will likely triple for the 0.10-micron node. With costs rising exponentially, it has become imperative for mask manufacturers to reduce both their manufacturing cycle time and their risk of mask re-work or scrap in order to remain profitable. Photomasks used in today's advanced sub-wavelength lithography processes are extremely complex, endowed with billions of optical proximity correction (OPC) features and enhanced by phase shift mask (PSM) topography, which minutely adjusts the wavelength of deep ultraviolet light. As a result of this adjustment, any small defect or critical dimension (CD) error on the reticle is magnified onto the silicon wafer. Advanced reticle inspection and defect analysis are critical to assessing the effects of these defects before they are printed onto wafers.

KLA-Tencor's PASS software enables mask manufacturers to characterize these defects without having to move the photomask from the inspector to an off-line aerial defect imaging tool. In addition, PASS automatically simulates how the defects will print onto the wafer before the photomask is shipped to a customer or used in production.

"With the rising cost of reticle manufacturing, it's imperative that defects are accurately identified and classified as quickly as possible to ensure the value of both the photomask and the wafer that is processed using it," stated Lance Glasser, vice president and general manager of KLA-Tencor's Reticle and Photomask Inspection Division. "PASS takes the guesswork out of determining if a sub-wavelength photomask will work as it was intended. As a result, our mask manufacturer customers avoid having to rely on operator expertise to make these determinations, as well as avoid the expense of making unnecessary repairs or scrapping the photomask altogether. The integration of Numerical's Virtual Stepper into PASS played an important role in enabling us to offer this capability to our customers."

PASS takes defect data and images collected by the reticle inspection tool, and simulates the image of the pattern and defects projected onto the wafer using a stepper model. PASS then compares the CD variation between the simulated data and the actual defect data to determine how the defects might print onto the wafer. PASS analyzes binary hard (chrome) defects, OPC features and assist line geometries, and is compatible with all current KLA-Tencor reticle inspection tools, including its 3XX, SL3, SL3UV and TeraStar™ Series. PASS is currently being shipped to customers.

Pointing to the complexities of sub-wavelength lithography, Atul Sharan, senior vice president of marketing and business development for Numerical, said, "What you see on a sub-wavelength photomask is not likely to be what's printed on the wafer. That's why we've developed products like Virtual Stepper to help quantify what will print or not print before a photomask ever enters a fab. Partnering with KLA-Tencor, an industry leader in reticle inspection, has enabled us to bring the benefits that Virtual Stepper provides, including reduced reticle manufacturing costs and faster time to market, to an even wider audience."

The use of Virtual Stepper in KLA-Tencor's PASS software represents an extension of an original equipment manufacturer agreement between the two companies, which will allow KLA-Tencor continued access to Numerical's leading-edge sub-wavelength technologies. The agreement also provides access to Numerical's technology modules for attenuated PSM analysis, automated defect severity scoring and alternating aperture PSM.


About Numerical Technologies: Numerical Technologies, Inc. (Nasdaq: NMTC), ranked as one of the 100 fastest growing technology companies by Forbes ASAP, develops and markets proprietary technology, software tools and services that enable the semiconductor industry to produce sub-wavelength integrated circuits, i.e., integrated circuits with components smaller than the wavelength of light used to create circuit patterns on silicon. Numerical's products and industry alliances form a comprehensive design-to-silicon solution that enables the creation of smaller, faster and more power-efficient semiconductors using available manufacturing equipment. Numerical's customers include the world's leading semiconductor companies, design automation tool vendors, semiconductor equipment suppliers and photomask manufacturers. Additional information about the company is available on the Web at


About KLA-Tencor: KLA-Tencor is the world leader in yield management and process control solutions for semiconductor manufacturing and related industries. Headquartered in San Jose, Calif., the company has sales and service offices around the world. An S&P 500 company, KLA-Tencor is traded on the Nasdaq National Market under the symbol KLAC.

Contact:
Meggan Powers
Director Corporate Communications